Growth temperature reduction for isoelectronic As-doped GaN

Wen Hsiung Lee*, Huai Ying Huang, Wei Chung Chen, Chiung Fen Lee, Wei-Kuo Chen, Wen Hsiung Chen, Ming Chih Lee

*此作品的通信作者

研究成果: Letter同行評審

指紋

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Engineering

Keyphrases

Chemical Engineering