Green Poly-Si TFTs: RF Breakthroughs (f{rm{T}}/f{\max}= 63.6/30\ \text{GHz}) by an Ingenious Process Design for IoT Modules on Everything

Y. J. Ye, P. H. Yu, C. K. Lee, P. W. Li, K. M. Chen, G. W. Huang, H. C. Lin

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

摘要

We report an ingenious, low-Temperature process platform for the fabrication of high-performance RF poly-Si TFTs with cut-off frequency (f{rm{T}}) of 63.6 GHz and maximum oscillation frequency (f{\max}) of 30 GHz, the highest values ever reported in poly-Si devices. The superior RF performance is achieved by an exquisite combination of large-grain poly-Si channel, T-shaped gate, sidewall air-spacers, and silicide electrodes, using nanosecond-pulsed green laser anneal, high etching selectivity, novel silicidation process by design, and microwave annealing for S/D dopant activation. Our reported poly-Si TFTs are a strong competitor against standard 0.35\mu rm{r} SOI CMOS devices, enabling a viable, cost-effective approach for a vast landscape of IoT and More-Than-Moore applications.

原文English
主出版物標題2021 IEEE International Electron Devices Meeting, IEDM 2021
發行者Institute of Electrical and Electronics Engineers Inc.
頁面4.3.1-4.3.4
ISBN(電子)9781665425728
DOIs
出版狀態Published - 2021
事件2021 IEEE International Electron Devices Meeting, IEDM 2021 - San Francisco, 美國
持續時間: 11 12月 202116 12月 2021

出版系列

名字Technical Digest - International Electron Devices Meeting, IEDM
2021-December
ISSN(列印)0163-1918

Conference

Conference2021 IEEE International Electron Devices Meeting, IEDM 2021
國家/地區美國
城市San Francisco
期間11/12/2116/12/21

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