@article{12d17a98425a4cc7a5e9e373145cf66d,
title = "Generally applicable self-masking technique for nanotips array fabrication",
abstract = "Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn-on field for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.",
keywords = "Chemical vapor deposition, Electron cyclotron resonance, Field emission, Nanostructure, Surface-enhanced Raman spectroscopy",
author = "Chen, {Kuei Hsien} and Hsu, {Chih Hsun} and Lo, {Hung Chun} and Surojit Chattopadhyay and Wu, {Chien Ting} and Hwang, {Jih Shang} and Yang, {Ying Jay} and Chen, {L. I.Chyong}",
note = "Funding Information: The authors would like to thank National Science Council, the AFOSR, Asian Office of Aerospace Research and Development and Army Research Office in Far East for financial support.",
year = "2005",
month = oct,
doi = "10.1142/S0219581X05003838",
language = "English",
volume = "4",
pages = "879--886",
journal = "International Journal of Nanoscience",
issn = "0219-581X",
publisher = "World Scientific Publishing Co. Pte Ltd",
number = "5-6",
}