Generally applicable self-masking technique for nanotips array fabrication

Kuei Hsien Chen; Chih Hsun Hsu; Hung Chun Lo; Surojit Chattopadhyay; Chien Ting Wu; Jih Shang Hwang; Debajyoti Das; Li Chyong Chen

doi:10.6180/jase.2004.7.3.01

Generally applicable self-masking technique for nanotips array fabrication

Kuei Hsien Chen^*, Chih Hsun Hsu, Hung Chun Lo, Surojit Chattopadhyay, Chien Ting Wu, Jih Shang Hwang, Debajyoti Das, Li Chyong Chen

^*此作品的通信作者

生醫光電研究所

研究成果: Article › 同行評審

6 引文斯高帕斯（Scopus）

摘要

Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn on filed for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.

原文	English
頁（從 - 到）	129-134
頁數	6
期刊	Tamkang Journal of Science and Engineering
卷	7
發行號	3
DOIs	https://doi.org/10.6180/jase.2004.7.3.01
出版狀態	Published - 1 9月 2004

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10.6180/jase.2004.7.3.01

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title = "Generally applicable self-masking technique for nanotips array fabrication",

abstract = "Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn on filed for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.",

keywords = "Field Emission, Nanotip, Surface Enhanced Raman Spectroscopy",

author = "Chen, {Kuei Hsien} and Hsu, {Chih Hsun} and Lo, {Hung Chun} and Surojit Chattopadhyay and Wu, {Chien Ting} and Hwang, {Jih Shang} and Debajyoti Das and Chen, {Li Chyong}",

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T1 - Generally applicable self-masking technique for nanotips array fabrication

AU - Chen, Kuei Hsien

AU - Hsu, Chih Hsun

AU - Lo, Hung Chun

AU - Chattopadhyay, Surojit

AU - Wu, Chien Ting

AU - Hwang, Jih Shang

AU - Das, Debajyoti

AU - Chen, Li Chyong

PY - 2004/9/1

Y1 - 2004/9/1

N2 - Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn on filed for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.

AB - Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn on filed for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.

KW - Field Emission

KW - Nanotip

KW - Surface Enhanced Raman Spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=4644307087&partnerID=8YFLogxK

U2 - 10.6180/jase.2004.7.3.01

DO - 10.6180/jase.2004.7.3.01

M3 - Article

AN - SCOPUS:4644307087

SN - 1560-6686

VL - 7

SP - 129

EP - 134

JO - Tamkang Journal of Science and Engineering

JF - Tamkang Journal of Science and Engineering

IS - 3

ER -

Generally applicable self-masking technique for nanotips array fabrication

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