Gate insulator morphology-dependent reliability in organic thin-film transistors

Hua Mao Chen*, Ting Chang Chang, Ya-Hsiang Tai, Hsiao Cheng Chiang, Kuan Hsien Liu, Min Chen Chen, Cheng Chieh Huang, Chao Kuei Lee

*此作品的通信作者

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

In this letter, we investigated the gate insulator morphology affecting on the electric characteristic variation for organic thin-film transistors (OTFTs). From the transfer characteristics, there is a result with leakage current when the gate voltage is lower than the threshold voltage, which is due to the gate insulator thickness variation. Furthermore, regardless of whether the OTFT is operated under positive or negative bias stress, the more severe degradation happened in the hump region of transfer characteristics. Because a thinner gate insulator causes a high electric field, more charges are trapped in a gate dielectric stack.

原文English
文章編號7360914
頁(從 - 到)228-230
頁數3
期刊IEEE Electron Device Letters
37
發行號2
DOIs
出版狀態Published - 1 2月 2016

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