摘要
Using self-aligned SiO2 nano-spheres as an etching mask, the authors demonstrated the formation of a GaN-based nano-inverted pyramid (NIP) structure. It was found that crystal quality of the GaN epilayer prepared on an NIP/GaN template was significantly better than that prepared with conventional low-temperature GaN nucleation layer. With the NIP structure, it was found that 20-mA light-emitting-diode (LED) output power can be enhanced by 32%, as compared with the conventional LED.
原文 | English |
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頁(從 - 到) | 1645-1647 |
頁數 | 3 |
期刊 | IEEE Photonics Technology Letters |
卷 | 21 |
發行號 | 21 |
DOIs | |
出版狀態 | Published - 1 11月 2009 |