Forward Bias Gate Breakdown Mechanism in Enhancement-Mode p-GaN Gate AlGaN/GaN High-Electron Mobility Transistors

Tian-Li Wu, Denis Marcon, Shuzhen You, Niels Posthuma, Benoit Bakeroot, Steve Stoffels, Marleen Van Hove, Guido Groeseneken, Stefaan Decoutere

研究成果: Article同行評審

199 引文 斯高帕斯(Scopus)

摘要

In this letter, we studied the forward bias gate breakdown mechanism on enhancement-mode p-GaN gate AlGaN/GaN high-electron mobility transistors. To the best of our knowledge, it is the first time that the temperature dependence of the forward gate breakdown has been characterized. We report for the first time on the observation of a positive temperature dependence, i.e., a higher temperature leads to a higher gate breakdown voltage. Such unexpected behavior is explained by avalanche breakdown mechanism: at a high positive gate bias, electron/hole pairs are generated in the depletion region at the Schottky metal/p-GaN junction. Furthermore, at a high gate bias but before the catastrophic gate breakdown, a light emission was detected by a emission microscopy measurement. This effect indicates an avalanche luminescence, which is mainly due to the recombination of the generated electron/hole pairs.

原文English
文章編號7180329
頁(從 - 到)1001-1003
頁數3
期刊Ieee Electron Device Letters
36
發行號10
DOIs
出版狀態Published - 10月 2015

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