Formation of nano-crystalline Si quantum dots in ZnO thin-films using a ZnO/Si multilayer structure

Kuang Yang Kuo; Shu Wei Hsu; Wen Ling Chuang; Po-Tsung Lee

doi:10.1016/j.matlet.2011.11.022

Formation of nano-crystalline Si quantum dots in ZnO thin-films using a ZnO/Si multilayer structure

Kuang Yang Kuo, Shu Wei Hsu, Wen Ling Chuang, Po-Tsung Lee^*

^*此作品的通信作者

光電工程學系

研究成果: Article › 同行評審

2 引文斯高帕斯（Scopus）

摘要

In this study, we propose to fabricate ZnO thin-films with nano-crystalline Si (nc-Si) quantum dots (QDs) embedded using a ZnO/Si multilayer structure by radio-frequency (RF) magnetron sputtering method. Our results show that a high Si sputtering power (P _Si) can assist the formation of self-aggregated Si nano-clusters during deposition, which is helpful for the crystallization of nc-Si QDs and ZnO matrix during annealing. Great crystallinity and highly uniform size of nc-Si QDs are obtained for P _Si of 110 W. We experimentally demonstrate the formation of nc-Si QDs embedded in crystalline ZnO thin-films, which has a great potential for various electro-optical device applications.

原文	English
頁（從 - 到）	463-465
頁數	3
期刊	Materials Letters
卷	68
DOIs	https://doi.org/10.1016/j.matlet.2011.11.022
出版狀態	Published - 1 2月 2012

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10.1016/j.matlet.2011.11.022

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title = "Formation of nano-crystalline Si quantum dots in ZnO thin-films using a ZnO/Si multilayer structure",

abstract = "In this study, we propose to fabricate ZnO thin-films with nano-crystalline Si (nc-Si) quantum dots (QDs) embedded using a ZnO/Si multilayer structure by radio-frequency (RF) magnetron sputtering method. Our results show that a high Si sputtering power (P Si) can assist the formation of self-aggregated Si nano-clusters during deposition, which is helpful for the crystallization of nc-Si QDs and ZnO matrix during annealing. Great crystallinity and highly uniform size of nc-Si QDs are obtained for P Si of 110 W. We experimentally demonstrate the formation of nc-Si QDs embedded in crystalline ZnO thin-films, which has a great potential for various electro-optical device applications.",

keywords = "Si quantum dot, Sputtering, Thin-films, ZnO",

author = "Kuo, {Kuang Yang} and Hsu, {Shu Wei} and Chuang, {Wen Ling} and Po-Tsung Lee",

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TY - JOUR

T1 - Formation of nano-crystalline Si quantum dots in ZnO thin-films using a ZnO/Si multilayer structure

AU - Kuo, Kuang Yang

AU - Hsu, Shu Wei

AU - Chuang, Wen Ling

AU - Lee, Po-Tsung

PY - 2012/2/1

Y1 - 2012/2/1

N2 - In this study, we propose to fabricate ZnO thin-films with nano-crystalline Si (nc-Si) quantum dots (QDs) embedded using a ZnO/Si multilayer structure by radio-frequency (RF) magnetron sputtering method. Our results show that a high Si sputtering power (P Si) can assist the formation of self-aggregated Si nano-clusters during deposition, which is helpful for the crystallization of nc-Si QDs and ZnO matrix during annealing. Great crystallinity and highly uniform size of nc-Si QDs are obtained for P Si of 110 W. We experimentally demonstrate the formation of nc-Si QDs embedded in crystalline ZnO thin-films, which has a great potential for various electro-optical device applications.

AB - In this study, we propose to fabricate ZnO thin-films with nano-crystalline Si (nc-Si) quantum dots (QDs) embedded using a ZnO/Si multilayer structure by radio-frequency (RF) magnetron sputtering method. Our results show that a high Si sputtering power (P Si) can assist the formation of self-aggregated Si nano-clusters during deposition, which is helpful for the crystallization of nc-Si QDs and ZnO matrix during annealing. Great crystallinity and highly uniform size of nc-Si QDs are obtained for P Si of 110 W. We experimentally demonstrate the formation of nc-Si QDs embedded in crystalline ZnO thin-films, which has a great potential for various electro-optical device applications.

KW - Si quantum dot

KW - Sputtering

KW - Thin-films

KW - ZnO

UR - http://www.scopus.com/inward/record.url?scp=82455192468&partnerID=8YFLogxK

U2 - 10.1016/j.matlet.2011.11.022

DO - 10.1016/j.matlet.2011.11.022

M3 - Article

AN - SCOPUS:82455192468

SN - 0167-577X

VL - 68

SP - 463

EP - 465

JO - Materials Letters

JF - Materials Letters

ER -

Formation of nano-crystalline Si quantum dots in ZnO thin-films using a ZnO/Si multilayer structure

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