Formation of inverted-pyramid structure by modifying laser processing parameters and acid etching time

Je Wei Lin*, En Ting Liu, Chien Hung Wu, Ing Jar Hsieh, Tien-Sheng Chao

*此作品的通信作者

研究成果: Conference contribution同行評審

6 引文 斯高帕斯(Scopus)

摘要

This paper is to investigate the possibility to fabricate the inverted-pyramid structure on silicon wafer base solar cell by using laser scribing technology. The UV spectrometer and SEM had also been used to observe the reflectance and microstructure of the wafer surface. In this experiment, a Q-switched Nd:YAG laser operating at wavelength of 1064nm is used to scribe on the p-type wafer surface to produce inverted-pyramid structure. In order to remove the laser damage, we used acid etching and Alkaline etching solutions to smooth the damage region and inverted pyramid structure formed, simultaneously.

原文English
主出版物標題Student Posters (General) - 219th ECS Meeting
頁面67-72
頁數6
版本31
DOIs
出版狀態Published - 2011
事件General Student Poster Session - 219th ECS Meeting - Montreal, QC, Canada
持續時間: 1 5月 20116 5月 2011

出版系列

名字ECS Transactions
號碼31
35
ISSN(列印)1938-5862
ISSN(電子)1938-6737

Conference

ConferenceGeneral Student Poster Session - 219th ECS Meeting
國家/地區Canada
城市Montreal, QC
期間1/05/116/05/11

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