Formation of CH3 radicals in the decomposition of trimethyl aluminum on hot solid surfaces

D. W. Squire*, C. S. Dulcey, Ming-Chang Lin

*此作品的通信作者

研究成果: Article同行評審

32 引文 斯高帕斯(Scopus)

摘要

The thermal decomposition of trimethyl aluminum on different hot substrates has been studied under low-pressure conditions. The products of the decomposition reaction were analyzed mass-spectrometrically using electron-impact and resonance-enhanced multiphoton ionization. The results of this study reveal that only CH3 appears as a gas-phase product and stable compounds such as CH4 and C2H6 are not observed under the conditions employed. The apparent activation energy for the production of the CH3 radical from the Al-coated hot substrates is measured to be 11 ± 2 kcal/mole.

原文English
頁(從 - 到)525-528
頁數4
期刊Chemical Physics Letters
116
發行號6
DOIs
出版狀態Published - 24 5月 1985

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