Fluorinated HfO ₂ gate dielectrics engineering for CMOS by pre-and post-CF ₄ plasma passivation

Woei Cherng Wu, Chao Sung Lai^*, Shih Ching Lee, Ma Ming-Wen, Tien-Sheng Chao, Jer Chyi Wang, Chih Wei Hsu, Pai Chi Chou, Jian Hao Chen, Kuo Hsing Kao, Wen Cheng Lo, Tsung Yi Lu, Li Lin Tay, Nelson Rowell