Fluorinated CMOS HfO2 for high performance (HP) and low stand-by power (LSTP) application by pre- and post-CF4 Plasma Passivation

Woei Cherng Wu*, Chao Sung Lai, Huai Hsien Chiu, Jer Chyi Wang, Pai Chi Chou, Tien-Sheng Chao

*此作品的通信作者

研究成果: Conference contribution › 同行評審

1 引文 斯高帕斯（Scopus）

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Physics & Astronomy