First Demonstration of Vertical Stacked Hetero-Oriented n-Ge (111)/p-Ge (100) CFET toward Mobility Balance Engineering

X. R. Yu, W. H. Chang, T. C. Hong, P. J. Sung, A. Agarwal, G. L. Luo, C. T. Wu, K. H. Kao, C. J. Su, S. W. Chang, W. H. Lu, P. Y. Fu, J. H. Lin, P. H. Wu, T. C. Cho, W. C.Yu Ma, D. D. Lu, T. S. Chao, T. Maeda, Y. J. LeeW. F. Wu, W. K. Yeh, Y. H. Wang

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

指紋

深入研究「First Demonstration of Vertical Stacked Hetero-Oriented n-Ge (111)/p-Ge (100) CFET toward Mobility Balance Engineering」主題。共同形成了獨特的指紋。

Keyphrases

Engineering

Material Science