First BEOL-compatible IGZO Ferroelectic-Modulated Diode with Drastically Enhanced Memory Window: Experiment, Modeling, and Deep Understanding

Leming Jiao, Zuopu Zhou, Zijie Zheng, Kaizhen Han, Qiwen Kong, Xiaolin Wang, Haiwen Xu, Jishen Zhang, Chen Sun, Yuye Kang, Gengchiau Liang, Xiao Gong*

*此作品的通信作者

研究成果: Conference contribution同行評審

2 引文 斯高帕斯(Scopus)

摘要

Tackling the key challenge of the weak erase in oxide semiconductor (OS) FeFETs, for the first time, we experimentally demonstrate a back-end-of-line (BEOL)-compatible IGZO-based ferroelectric-modulated diode (FMD), which effectively doubles the memory window (MW) of the FeFET fabricated under the same process conditions. To provide a clear understanding of the MW enhancement, we develop and establish a comprehensive simulation framework that reveals the interplay between ferroelectric polarization and the current rectified by the metal- semiconductor Schottky diode. Furthermore, through a combination of experimental measurement and theoretical calculation, we validate the performance of our novel FMD device in overcoming the weak erase problem of OS FeFETs. Our study demonstrates the tremendous promise of our FMD for future data storage and in-memory computing applications.

原文English
主出版物標題2023 International Electron Devices Meeting, IEDM 2023
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9798350327670
DOIs
出版狀態Published - 2023
事件2023 International Electron Devices Meeting, IEDM 2023 - San Francisco, 美國
持續時間: 9 12月 202313 12月 2023

出版系列

名字Technical Digest - International Electron Devices Meeting, IEDM
ISSN(列印)0163-1918

Conference

Conference2023 International Electron Devices Meeting, IEDM 2023
國家/地區美國
城市San Francisco
期間9/12/2313/12/23

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