Ferroelectric HfO2 capacitors for varactor application in GHz

Y. W. Lin, K. Mizutani, T. Hoshii, H. Wakabayashi, K. Tsutsui, Y. F. Tsao, T. J. Huang, H. T. Hsu, K. Kakushima

研究成果: Conference contribution同行評審

摘要

Capacitance measurements of a ferroelectric Y-doped HfO2 film at 1 GHz are performed. By applying a bias voltage within the non-switching region of the ferroelectric film, the change in the capacitance has been confirmed. The results suggest the feasibility of ferroelectric HfO2 films for varactor application in high frequency region.

原文English
主出版物標題PRiME 2020
主出版物子標題Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences
編輯D. Misra, S. De Gendt, K. Kita, K. Kakushima, P. Mascher, U. Cvelbar, F. Roozeboom, G. W. Hunter, L. J. Li, C. O'Dwyer
發行者IOP Publishing Ltd.
頁面71-76
頁數6
版本3
ISBN(電子)9781607688983
DOIs
出版狀態Published - 2020
事件Pacific Rim Meeting on Electrochemical and Solid State Science 2020, PRiME 200 - Honolulu, 美國
持續時間: 4 10月 20209 10月 2020

出版系列

名字ECS Transactions
號碼3
98
ISSN(列印)1938-6737
ISSN(電子)1938-5862

Conference

ConferencePacific Rim Meeting on Electrochemical and Solid State Science 2020, PRiME 200
國家/地區美國
城市Honolulu
期間4/10/209/10/20

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