@inproceedings{ceaf00eb757f4217844b681d9df3e369,
title = "Fabry-Perot type antireflective coatings for binary mask applications in ArF and F 2 excimer laser lithographies",
abstract = "We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F2 excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.",
author = "Chen, {H. L.} and Lee, {C. C.} and Chuang, {Y. F.} and Liu, {M. C.} and Hsieh, {C. I.} and Fu-Hsiang Ko",
note = "Publisher Copyright: {\textcopyright} 2003 IEEE.; 5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003 ; Conference date: 15-12-2003 Through 19-12-2003",
year = "2003",
doi = "10.1109/CLEOPR.2003.1277293",
language = "English",
series = "Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "757",
booktitle = "CLEO/Pacific Rim 2003 - 5th Pacific Rim Conference on Lasers and Electro-Optics",
address = "United States",
}