Fabrication of Pi-phase shift x-ray zone plates

Keyphrases

• Zone Plate 100%
• π-phase Shift 100%
• Chromium 33%
• Silicon Nitride 16%
• Low Pressure Chemical Vapor Deposition (LPCVD) 16%
• Reactive Ion Etching 16%
• Electron Beam Lithography 16%
• Silicon Substrate 16%
• Absorber 16%
• Phase Shift 16%
• Fabrication Methods 16%
• (100) Silicon 16%
• Tungsten 16%
• Scanning Electron Microscope Image 16%
• Low Stress 16%
• Trilayer 16%
• SiNx 16%
• Backside Etching 16%
• Free-standing Membrane 16%
• SiNx Film 16%
• Ray Optics 16%
• Ray Scanning 16%
• Microfocus 16%
• Mask Technology 16%
• Photon Emission Microscopy 16%

Physics

• Vapor Deposition 100%
• Scanning Electron Microscopy 100%
• Silicon Nitride 100%
• Geometrical Optics 100%