Fabrication of NiSi2 nanocrystals embedded in SiO2 with memory effect by oxidation of the amorphous Si/Ni/SiO2 structure

P. H. Yeh*, H. H. Wu, C. H. Yu, L. J. Chen, Po-Tsun Liu, C. H. Hsu, T. C. Chang

*此作品的通信作者

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

指紋

深入研究「Fabrication of NiSi2 nanocrystals embedded in SiO2 with memory effect by oxidation of the amorphous Si/Ni/SiO2 structure」主題。共同形成了獨特的指紋。

Keyphrases

Material Science