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Fabrication of high-sensitivity polycrystalline silicon nanowire field-effect transistor ph sensor using conventional complementary metal-oxide-semiconductor technology
Hou Yu Chen
*
, Chia Yi Lin, Min Cheng Chen, Chien Chao Huang,
Chao-Hsin Chien
*
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引文 斯高帕斯(Scopus)
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深入研究「Fabrication of high-sensitivity polycrystalline silicon nanowire field-effect transistor ph sensor using conventional complementary metal-oxide-semiconductor technology」主題。共同形成了獨特的指紋。
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Keyphrases
Polysilicon
100%
Silicon Nanowire Field-effect Transistor (SNWFET)
100%
High Sensitivity
100%
PH Sensor
100%
Complementary Metal-oxide-semiconductor Technology
100%
Self-aligned
50%
Vertical Channel
50%
Complementary Metal Oxide Semiconductor
50%
High Cost
25%
Integrated Circuits
25%
Threshold Voltage Shift
25%
Fabrication Methods
25%
NWFET
25%
Pre-oxidation
25%
Gate Bias
25%
Nanowires
25%
On-a-chip
25%
PH-sensitive
25%
Coupled Operation
25%
Bias Control
25%
Nanowire Devices
25%
Independent Gate
25%
Sensitivity Threshold
25%
ISFET
25%
Electrical Uniformity
25%
Semiconductor Process
25%
Surface Channel
25%
Buried Channel
25%
Self-aligned Fabrication
25%
Field-effect Sensor
25%
Biosensor System
25%
Silicon Nanowire Sensor
25%
Very Large Scale Integrated Circuits
25%
Semiconductor Manufacturing Process
25%
Very Large Scale Integration
25%
Silicon Devices
25%
Lithography Equipment
25%
Engineering
Field-Effect Transistor
100%
Using Sensor
100%
Complementary Metal-Oxide-Semiconductor
100%
Polysilicon
100%
Nanowire
100%
Field Effect Transistor
20%
Biosensor
20%
Semiconductor Manufacturing
20%
Manufacturing Process
20%
VLSI Circuits
20%
Gate Bias
20%
Silicon Device
20%
Reoxidation
20%
Fabrication Approach
20%
Large Scale Integrated Circuit
20%
Nanowire Device
20%
Sensitive Ion Channel
20%
Lithography
20%
Sensitivity Threshold
20%
Material Science
Silicon
100%
Nanowire
100%
Field Effect Transistor
100%
Complementary Metal-Oxide-Semiconductor Device
100%
Electronic Circuit
33%
Surface (Surface Science)
33%
Lithography
16%
Silicon Device
16%