@inproceedings{be6d0392aace404b87d6729708b519f0,
title = "Fabrication of deep lateral single-crystal-silicon blaze micro-grating by inductively-coupled-plasma reactive ion etch",
abstract = "This paper presents a method by using a compensative structure assisted to fabricate deep lateral single-crystal-silicon (SCS) blaze micro-grating at Inductively-Coupled-Plasma Reactive Ion Etch (ICP-RIE). Due to the high resolution of blaze micro-grating, it's hard to maintain the teeth structure of blaze micro-grating under deep silicon etch in ICP-RIE process. Here, the independent rectangular structure and symmetrical structure to micro-grating is designed to obstruct the non-vertical plasma ion to etch the sidewall of micro-grating structure and to get better the profile control at deep micro-grating structure. The lateral silicon blaze micro-grating with 100 μm thickness by compensative structure assisted etch process have been successfully demonstrated this method.",
keywords = "Inductively-Coupled-Plasma Reactive Ion Etch (ICP-RIE), blaze graing",
author = "Lin, {Y. H.} and Weng, {C. J.} and Su, {C. Y.} and W. Hsu",
year = "2012",
doi = "10.1109/NEMS.2012.6196869",
language = "English",
isbn = "9781467311243",
series = "2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012",
pages = "689--692",
booktitle = "2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012",
note = "7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 ; Conference date: 05-03-2012 Through 08-03-2012",
}