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Fabrication of 3D quantum dot array by fusion of bio-template and neutral beam etching I: Basic technologies
Seiji Samukawa
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電信工程研究所
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Keyphrases
Surface Roughness
100%
High Density
100%
GaAs Substrate
100%
Ferritin
100%
Quantum Dot Arrays
100%
Surface Oxide
100%
Neutral Beam
100%
Neutral Beam Etching
100%
2D Array
100%
Biotemplate
100%
Shell Proteins
100%
Low Temperature
50%
Si Substrate
50%
Gallium Arsenide
50%
Novel Solutions
50%
Gas Mixture
50%
RF Bias
50%
Iron Oxide
50%
3D Arrays
50%
Argon Gas
50%
Two-dimensional Array
50%
Atomic Level
50%
O Radical
50%
Chlorine
50%
Oxidation Method
50%
Uniform Density
50%
Oxidation Mechanism
50%
Level Surface
50%
Hydrophilic Surface
50%
Bias Power
50%
Oxide Removal
50%
Packing Density
50%
Ferritin Protein
50%
Surface Oxidation
50%
GaAs Nanostructures
50%
Iron Core
50%
Surface Hydrophobicity
50%
Direct Formation
50%
Taper Angle
50%
Negative zeta Potential
50%
Vertical Taper
50%
Core Removal
50%
Engineering
Gallium Arsenide
100%
Quantum Dot
100%
Gaas Substrate
100%
Surface Oxide
100%
Thin Films
50%
Si Substrate
50%
Low-Temperature
50%
Two Dimensional
50%
Nanomaterial
50%
3d Array
50%
Dimensional Array
50%
Hydrophilic Surface
50%
Zeta Potential
50%
Iron Core
50%
Surface Hydrophilicity
50%
Taper Angle
50%
Gas Mixture
50%
Material Science
Density
100%
Gallium Arsenide
100%
Quantum Dot
100%
Oxidation Reaction
75%
Surface (Surface Science)
75%
Surface Roughness
50%
Oxide Surface
50%
Thin Films
25%
Iron Oxide
25%
Nanostructure
25%
Gas Mixture
25%