Fabrication and simulation of neutral-beam-etched silicon nanopillars

Min Hui Chuang, Daisuke Ohori, Yi-Ming Li*, Kuan Ru Chou, Seiji Samukawa

*此作品的通信作者

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

In this study, we do the experiment and simulation of the silicon nanopillars fabricated by a damage-free neutral-beam-etching system combined with bio-template-mask technology. The fabricated silicon nanopillars are with the diameter of 16 nm and the height of 90 nm and the density is 6.5 × 1010/cm2 with variation of 3%. We model and simulate the fabricated silicon nanopillars by periodical cylinder in Si0.7Ge0.3 matrix to estimate the energy profile with different wave vectors. The variations of the energy with respect to the height, diameter, and the separation of the simulated silicon nanopillars are reported. The results of this work will be useful for thermoelectric applications.

原文English
文章編號109577
頁數5
期刊Vacuum
181
DOIs
出版狀態Published - 11月 2020
事件24th International Electron Devices and Materials Symposium (IEDMS) - Taipei
持續時間: 24 10月 201925 10月 2019

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