跳至主導覽 跳至搜尋 跳過主要內容

Fabrication and emission characteristic of InGaN/GaN multiple quantum wells nanorods

  • T. H. Hsueh*
  • , Y. S. Chang
  • , F. Lai
  • , H. W. Huang
  • , M. C. Ou-yang
  • , C. W. Chang
  • , Hao-Chung Kuo
  • , S. C. Wang
  • , J. K. Sheu
  • *此作品的通信作者

研究成果: Conference article同行評審

摘要

InGaN/GaN multiple quantum wells (MQWs) nanorods with 100 nm in diameter were fabricated by inductively coupled plasma (ICP) etching. The nanorods show large blue-shift in peak photoluminescence emission wavelength compared to that of the bulk emission.

原文English
頁(從 - 到)607-608
頁數2
期刊OSA Trends in Optics and Photonics Series
97
DOIs
出版狀態Published - 5月 2004
事件International Quantum Electronics Conference, IQEC - San Francisco, CA, 美國
持續時間: 21 5月 200426 5月 2004

指紋

深入研究「Fabrication and emission characteristic of InGaN/GaN multiple quantum wells nanorods」主題。共同形成了獨特的指紋。

引用此