Fabrication and characterization of a junctionless SONOS transistor with poly-Si nanowire channels

  • Tuan Kai Su*
  • , Tzu I. Tsai
  • , Chun Jung Su
  • , Horng-Chih Lin
  • , Tiao Yuan Huang
  • *此作品的通信作者

    研究成果: Conference contribution同行評審

    1 引文 斯高帕斯(Scopus)

    摘要

    In this paper, we demonstrate a junctionless (JL) polysilicon-oxide- nitride-oxide-silicon (SONOS) poly-Si nanowire (NW) transistor whose source/drain (S/D) and channel regions are of the same doping type and concentration. Due to the higher carrier concentration in the channel, the JL device exhibits better drive current and program efficiency than its counterpart with undoped channel. Memory reliability characteristics such as data retention and endurance are also discussed.

    原文English
    主出版物標題4th IEEE International NanoElectronics Conference, INEC 2011
    DOIs
    出版狀態Published - 26 9月 2011
    事件4th IEEE International Nanoelectronics Conference, INEC 2011 - Tao-Yuan, 台灣
    持續時間: 21 6月 201124 6月 2011

    出版系列

    名字Proceedings - International NanoElectronics Conference, INEC
    ISSN(列印)2159-3523

    Conference

    Conference4th IEEE International Nanoelectronics Conference, INEC 2011
    國家/地區台灣
    城市Tao-Yuan
    期間21/06/1124/06/11

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