Extraction of Ultra-Low Contact Resistivity by End-Resistance Method

Bing-Yue Tsui, Ya Hsin Lee, Dong Ying Wu, Yao Jen Lee, Mei Yi Li

研究成果: Conference contribution同行評審

摘要

Accuracy of extracting ultra-low contact resistivity by the end-resistance method is evaluated. As the contact length becomes smaller than the transfer length, the end-resistance approaches the contact resistance, and the error decreases with the reduction of contact length and contact resistivity. The contact resistivity lower than 10{-9}Ω-\mathrm{c}\mathrm{m}{2} can be extracted with accuracy lower than 3× 10{-10}Ω-\mathrm{c}\mathrm{m}{2}. This end-resistance method is verified by self-aligned transmission line model test structure. Statistic analysis of the distribution of contact resistance and the uniformity of the contact interface are also demonstrated.

原文English
主出版物標題2020 IEEE 33rd International Conference on Microelectronic Test Structures, ICMTS 2020 - Proceedings
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781728140087
DOIs
出版狀態Published - 5月 2020
事件33rd IEEE International Conference on Microelectronic Test Structures, ICMTS 2020 - Edinburgh, United Kingdom
持續時間: 4 5月 202018 5月 2020

出版系列

名字IEEE International Conference on Microelectronic Test Structures
2020-May

Conference

Conference33rd IEEE International Conference on Microelectronic Test Structures, ICMTS 2020
國家/地區United Kingdom
城市Edinburgh
期間4/05/2018/05/20

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