Exposure schedule for multiplexing holograms in photopolymer

Shiuan-Huei Lin; Ken-Yuh Hsu; Wei Zheng Chen; Wha Tzong Whang

doi:10.1117/12.363923

Exposure schedule for multiplexing holograms in photopolymer

Shiuan-Huei Lin^*, Ken-Yuh Hsu, Wei Zheng Chen, Wha Tzong Whang

^*此作品的通信作者

研究成果: Conference article › 同行評審

9 引文斯高帕斯（Scopus）

摘要

We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.

原文	English
頁（從 - 到）	100-106
頁數	7
期刊	Proceedings of SPIE - The International Society for Optical Engineering
卷	3801
DOIs	https://doi.org/10.1117/12.363923
出版狀態	Published - 1 12月 1999
事件	Proceedings of the 1999 Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V - Denver, CO, USA 持續時間: 18 7月 1999 → 19 7月 1999

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title = "Exposure schedule for multiplexing holograms in photopolymer",

abstract = "We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.",

author = "Shiuan-Huei Lin and Ken-Yuh Hsu and Chen, {Wei Zheng} and Whang, {Wha Tzong}",

year = "1999",

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journal = "Proceedings of SPIE - The International Society for Optical Engineering",

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T1 - Exposure schedule for multiplexing holograms in photopolymer

AU - Lin, Shiuan-Huei

AU - Hsu, Ken-Yuh

AU - Chen, Wei Zheng

AU - Whang, Wha Tzong

PY - 1999/12/1

Y1 - 1999/12/1

N2 - We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.

AB - We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.

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U2 - 10.1117/12.363923

DO - 10.1117/12.363923

M3 - Conference article

AN - SCOPUS:0033354293

SN - 0277-786X

VL - 3801

SP - 100

EP - 106

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1999 Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V

Y2 - 18 July 1999 through 19 July 1999

ER -

Exposure schedule for multiplexing holograms in photopolymer

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