Exploring Next-Generation GaN Power Devices with Ferroelectric Charge Trap Gate Stack Technology for Normally-OFF Operations

Edward Yi Chang*, Jui Sheng Wu, Tsung Ying Yang, Chen Hsi Tsai

*此作品的通信作者

研究成果: Conference contribution同行評審

原文English
主出版物標題2023 21st International Workshop on Junction Technology, IWJT 2023
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9784863488076
DOIs
出版狀態Published - 2023
事件21st International Workshop on Junction Technology, IWJT 2023 - Hybrid, Kyoto, Japan
持續時間: 8 6月 20239 6月 2023

出版系列

名字2023 21st International Workshop on Junction Technology, IWJT 2023

Conference

Conference21st International Workshop on Junction Technology, IWJT 2023
國家/地區Japan
城市Hybrid, Kyoto
期間8/06/239/06/23

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