Experimental investigation on the sputtering process for tantalum oxynitride thin films

Medicine & Life Sciences

• methyl orange 100%
• Tantalum 75%
• X-Ray Emission Spectrometry 37%
• Oxygen 36%
• Photolysis 36%
• Raman Spectrum Analysis 33%
• Oxides 30%
• X-Ray Diffraction 30%
• Near-Infrared Spectroscopy 30%
• Nitrogen 25%
• Metals 22%
• Electrons 20%
• Hot Temperature 19%
• Light 18%
• Water 17%

Engineering & Materials Science

• Tantalum 70%
• Sputtering 64%
• Thin films 47%
• Flow rate 22%
• Crystalline materials 21%
• Optical band gaps 20%
• Amorphous films 16%
• Oxygen 16%
• Photodegradation 16%
• Rapid thermal annealing 15%
• Hall effect 13%
• Raman spectroscopy 13%
• X-Ray Emission Spectrometry 13%
• Crystal structure 13%
• Optical properties 12%
• Nitrides 12%
• Surface morphology 11%
• Spectroscopy 11%
• Light sources 11%
• Irradiation 10%
• X ray diffraction 9%
• Electron microscopes 9%
• Nitrogen 9%
• Characterization (materials science) 8%
• Oxides 8%
• Scanning 7%
• Degradation 7%
• Chemical analysis 6%
• Metals 6%
• Water 5%

Physics & Astronomy

• oxynitrides 60%
• tantalum 55%
• sputtering 39%
• thin films 26%
• flow velocity 20%
• oxygen 10%
• spectroscopy 8%
• nitrides 7%
• Hall effect 7%
• x rays 7%
• Raman spectroscopy 7%
• light sources 6%
• electron microscopes 6%
• crystal structure 6%
• degradation 6%
• nitrogen 6%
• optical properties 5%
• irradiation 5%
• electrical resistivity 5%
• scanning 5%
• oxides 5%
• probes 5%
• annealing 5%
• water 4%
• characterization 4%
• diffraction 4%
• metals 4%
• energy 2%