摘要
Wet-etched pattern sapphire substrate (PSS) has been employed to improve the epitaxy of GaN-based LEDs. It was found that the crystal quality and performance of LEDs improved with decrease in c-plane areas of PSS. However, further decrease in bottom c-plane areas makes epitaxy of GaN film very difficult. In this research, the evolution of bottom c-plane was investigated through a systematic study. It was found that epitaxy difficulty might be due to the appearance of 6C facets {41318} and the disappearance of bottom c-plane.
原文 | English |
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頁(從 - 到) | R169-R171 |
期刊 | ECS Journal of Solid State Science and Technology |
卷 | 2 |
發行號 | 9 |
DOIs | |
出版狀態 | Published - 2013 |