Evaluation of analog performance of monolayer and bilayer two-dimensional transition metal dichalcogenide (TMD) MOSFETs

Hung Yi Lee, Chang Hung Yu, Pin Su, Ching Te Chuang

    研究成果: Conference contribution同行評審

    2 引文 斯高帕斯(Scopus)

    摘要

    We investigate the analog performance of monolayer and bilayer two-dimensional transition metal dichalcogenide (TMD) MOSFETs. The device analog metrics including the transconductance (g m ), output resistance (R o ) and intrinsic gain (g m × R o ) for TMD device are investigated using 3D atomistic TCAD simulations. It is shown that bilayer TMD devices exhibit better analog performance compared with monolayer TMD devices. The impacts of different mobility ratios of bilayer TMD devices to monolayer TMD devices are examined.

    原文English
    主出版物標題2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017
    發行者Institute of Electrical and Electronics Engineers Inc.
    ISBN(電子)9781509058051
    DOIs
    出版狀態Published - 7 6月 2017
    事件2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017 - Hsinchu, 台灣
    持續時間: 24 4月 201727 4月 2017

    出版系列

    名字2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017

    Conference

    Conference2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017
    國家/地區台灣
    城市Hsinchu
    期間24/04/1727/04/17

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