Estimating the Process Variation Effects of Stacked Gate All Around Si Nanosheet CFETs Using Artificial Neural Network Modeling Framework

Rajat Butola, Yiming Li*, Sekhar Reddy Kola, Min Hui Chuang, Chandni Akbar

*此作品的通信作者

研究成果: Conference contribution › 同行評審

2 引文 斯高帕斯（Scopus）

指紋

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Keyphrases

Engineering

Material Science