ESD HBM Discharge Model in RF GaN-on-Si (MIS)HEMTs

W. M. Wu*, S. H. Chen, A. Sibaja-Hernandez, S. Yadav, U. Peralagu, H. Yu, A. Alian, V. Putcha, B. Parvais, G. Groeseneken, M. D. Ker, N. Collaert

*此作品的通信作者

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

摘要

We report on our extensive experimental and simulation study to understand ESD failure mechanisms in RF GaN-on-Si (MIS)HEMTs. As opposed to ESD clamp transistors in LV CMOS technologies, a mis-correlation between standard-defined HBM ESD robustness and commonly used TLP failure current was observed in GaN (MIS)HEMTs. Using transient HBM IV characteristics, a novel discharge model is proposed to explain the transient discharge mechanism. The TCAD and SPICE simulations confirmed that the observed mis-correlation between TLP and HBM is attributed to 2DEG channel resistance modulation in response to HBM ESD transient voltage waveforms.

原文English
主出版物標題2021 IEEE International Electron Devices Meeting, IEDM 2021
發行者Institute of Electrical and Electronics Engineers Inc.
頁面39.5.1-39.5.4
ISBN(電子)9781665425728
DOIs
出版狀態Published - 2021
事件2021 IEEE International Electron Devices Meeting, IEDM 2021 - San Francisco, 美國
持續時間: 11 12月 202116 12月 2021

出版系列

名字Technical Digest - International Electron Devices Meeting, IEDM
2021-December
ISSN(列印)0163-1918

Conference

Conference2021 IEEE International Electron Devices Meeting, IEDM 2021
國家/地區美國
城市San Francisco
期間11/12/2116/12/21

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