Erratum: Room-temperature deposition of a poling-free ferroelectric AlScN film by reactive sputtering (Applied Physics Letters (2021)118 (082902) DOI: 10.1063/5.0035335)

Sung Lin Tsai, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Tien Kan Chung, Edward Y. Chang, Kuniyuki Kakushima*

*此作品的通信作者

研究成果: Comment/debate

摘要

This article was originally published online on 25 February 2021 with an error in the affiliation. The affiliation is correct above. All online and printed versions of the article were corrected on 3 March 2021.

原文English
文章編號109901
期刊Applied Physics Letters
118
發行號10
DOIs
出版狀態Published - 8 三月 2021

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