@article{6b962ce7dce84875a3d7feb0d9a55ba9,
title = "Erratum: Low-Temperature Microwave Annealing Processes for Future IC Fabrication - A Review (IEEE Trans. Electron Devices (2014) 61:3 (651–665) DOI: 10.1109/TED.2014.2300898)",
abstract = "The above article [1] presented data on microwave annealing of implanted ions in silicon. There are several typos in the figure captions and labels, and the authors would like to correct them. The text is correct, and the conclusion of [1] is not impacted by these revisions.",
author = "Lee, {Yao Jen} and Cho, {Ta Chun} and Chuang, {Shang Shiun} and Hsueh, {Fu Kuo} and Lu, {Yu Lun} and Sung, {Po Jung} and Chen, {Hsiu Chih} and Current, {Michael I.} and Tseung-Yuen Tseng and Chao, {Tien Sheng} and Chenming Hu and Yang, {Fu Liang}",
note = "Publisher Copyright: {\textcopyright} 1963-2012 IEEE.",
year = "2023",
month = jul,
day = "1",
doi = "10.1109/TED.2023.3272843",
language = "English",
volume = "70",
pages = "3983",
journal = "IEEE Transactions on Electron Devices",
issn = "0018-9383",
publisher = "IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC",
number = "7",
}