Erratum: Low-Temperature Microwave Annealing Processes for Future IC Fabrication - A Review (IEEE Trans. Electron Devices (2014) 61:3 (651–665) DOI: 10.1109/TED.2014.2300898)

Yao Jen Lee*, Ta Chun Cho, Shang Shiun Chuang, Fu Kuo Hsueh, Yu Lun Lu, Po Jung Sung, Hsiu Chih Chen, Michael I. Current, Tseung-Yuen Tseng, Tien Sheng Chao, Chenming Hu, Fu Liang Yang

*此作品的通信作者

研究成果: Comment/debate

摘要

The above article [1] presented data on microwave annealing of implanted ions in silicon. There are several typos in the figure captions and labels, and the authors would like to correct them. The text is correct, and the conclusion of [1] is not impacted by these revisions.

原文English
頁(從 - 到)3983
頁數1
期刊IEEE Transactions on Electron Devices
70
發行號7
DOIs
出版狀態Published - 1 7月 2023

指紋

深入研究「Erratum: Low-Temperature Microwave Annealing Processes for Future IC Fabrication - A Review (IEEE Trans. Electron Devices (2014) 61:3 (651–665) DOI: 10.1109/TED.2014.2300898)」主題。共同形成了獨特的指紋。

引用此