Erratum: Direct patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (Electrochemical and Solid-State Letters (2003) 6 (G69))
- T. C. Chang*
- , T. M. Tsai
- , Po-Tsun Liu
- , Y. S. Mor
- , C. W. Chen
- , Jeng-Tzong Sheu
- , Tseung-Yuen Tseng
*此作品的通信作者
研究成果: Comment/debate