Ellipsometric measurements and its alignment: Using the intensity ratio technique

Yu Faye Chao Yschao, Chi Shin Wei, Wen Chi Lee, Shy Chaung Lin, Tien-Sheng Chao

研究成果: Article同行評審

8 引文 斯高帕斯(Scopus)

摘要

Using first-order treatment on azimuth errors of the polarizer (P) and analyzer (A) with respect to the plane of incidence (POI), we construct two intensity ratios around a certain configuration, such as P= ±п/4 and A = 0 as compared to A = п/2. These expressions can be used not only to align the azimuths of the polarizer and analyzer to the POI, but also to obtain the ellipsometric parameter Ψ without locating the minimum intensity. BK7 glass and Si02/Si thin film are ultilized to evaluate this technique.

原文English
頁(從 - 到)5016-5019
頁數4
期刊Japanese journal of applied physics
34
發行號9R
DOIs
出版狀態Published - 9月 1995

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