Electron-electron scattering-induced channel hot electron injection in nanoscale n-channel metal-oxide-semiconductor field-effect-transistors with high-k/metal gate stacks

Jyun Yu Tsai*, Ting Chang Chang, Ching En Chen, Szu Han Ho, Kuan Ju Liu, Ying Hsin Lu, Xi Wen Liu, Tseung-Yuen Tseng, Osbert Cheng, Cheng Tung Huang, Ching Sen Lu

*此作品的通信作者

研究成果: Article › 同行評審

3 引文 斯高帕斯（Scopus）

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Keyphrases

Engineering

Material Science