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Electromigration and Temperature Cycling Tests of Cu-Cu Joints Fabricated by Instant Copper Direct Bonding
Kai Cheng Shie
, Po Ning Hsu
, Yu Jin Li
, K. N. Tu
, Benson Tzu Hung Lin
, Chia Cheng Chang
,
Chih Chen
國際半導體產業學院
新世代功能性物質研究中心
智慧半導體奈米系統技術研究中心
材料科學與工程學系
研究成果
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Conference contribution
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同行評審
16
引文 斯高帕斯(Scopus)
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Keyphrases
Electromigration
100%
Copper Direct Bonding
100%
Temperature Cycling Test
100%
Cu-Cu Joints
100%
Reliability Test
50%
Passivation
25%
Bonding Structure
25%
Cu-Cu Bonding
25%
Bonding Condition
25%
Bonding Process
25%
Failure Mechanism
25%
Finite Element Analysis
25%
Hybrid Bonding
25%
Solder Joint
25%
Current Crowding
25%
Test Temperature
25%
3D IC Packaging
25%
Underfill
25%
Bonding Interface
25%
Image Element
25%
Several Samples
25%
Cross-sectional Imaging
25%
Organic Dielectric
25%
Neighboring Structure
25%
Engineering
Joints (Structural Components)
100%
Electromigration
100%
Direct Bonding
100%
Reliability Analysis
50%
Passivation
25%
Dielectrics
25%
Cross Section
25%
Bonding Process
25%
Failure Mechanism
25%
Test Temperature
25%
Underfill
25%
Bonding Structure
25%
Crack Test
25%
Finite Element Analysis
25%
Material Science
Finite Element Method
100%
Solder Joint
100%
Dielectric Material
100%