Electrochromic study on amorphous tungsten oxide films by sputtering

Chuan Li; J. H. Hsieh; Ming Tsung Hung; B. Q. Huang

doi:10.1016/j.tsf.2014.12.022

Electrochromic study on amorphous tungsten oxide films by sputtering

Chuan Li^*, J. H. Hsieh, Ming Tsung Hung, B. Q. Huang

^*此作品的通信作者

生物醫學工程學系

研究成果: Article › 同行評審

25 引文斯高帕斯（Scopus）

摘要

Tungsten oxide films under different oxygen flow rates are deposited by DC sputtering. The voltage change at target and analyses for the deposited films by X-ray diffraction, scanning electronic microscope, X-ray photoelectron spectroscopy and ultraviolet-visible-near infrared spectroscopy consistently indicate that low oxygen flow rate (5 sccm) only creates metal-rich tungsten oxide films, while higher oxygen flow rate (10-20 sccm) assures the deposition of amorphous WO₃ films. To explore the electrochromic function of deposited WO₃ films, we use electrochemical tests to perform the insertion of lithium ions and electrons into films. The WO₃ films switch between color and bleach states effectively by both potentiostat and cyclic voltammetry. Quantitative evaluation on electrochemical tests indicates that WO₃ film with composition close to its stoichiometry is an optimal choice for electrochromic function.

原文	English
頁（從 - 到）	75-82
頁數	8
期刊	Thin Solid Films
卷	587
DOIs	https://doi.org/10.1016/j.tsf.2014.12.022
出版狀態	Published - 31 7月 2015

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title = "Electrochromic study on amorphous tungsten oxide films by sputtering",

abstract = "Tungsten oxide films under different oxygen flow rates are deposited by DC sputtering. The voltage change at target and analyses for the deposited films by X-ray diffraction, scanning electronic microscope, X-ray photoelectron spectroscopy and ultraviolet-visible-near infrared spectroscopy consistently indicate that low oxygen flow rate (5 sccm) only creates metal-rich tungsten oxide films, while higher oxygen flow rate (10-20 sccm) assures the deposition of amorphous WO3 films. To explore the electrochromic function of deposited WO3 films, we use electrochemical tests to perform the insertion of lithium ions and electrons into films. The WO3 films switch between color and bleach states effectively by both potentiostat and cyclic voltammetry. Quantitative evaluation on electrochemical tests indicates that WO3 film with composition close to its stoichiometry is an optimal choice for electrochromic function.",

keywords = "Amorphous film, Cyclic voltammetry, Electrochemical insertion, Electrochromism, Potentiostat, Sputtering, Tungsten oxide",

author = "Chuan Li and Hsieh, {J. H.} and Hung, {Ming Tsung} and Huang, {B. Q.}",

note = "Publisher Copyright: {\textcopyright} 2014 Elsevier B.V.",

year = "2015",

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doi = "10.1016/j.tsf.2014.12.022",

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T1 - Electrochromic study on amorphous tungsten oxide films by sputtering

AU - Li, Chuan

AU - Hsieh, J. H.

AU - Hung, Ming Tsung

AU - Huang, B. Q.

PY - 2015/7/31

Y1 - 2015/7/31

N2 - Tungsten oxide films under different oxygen flow rates are deposited by DC sputtering. The voltage change at target and analyses for the deposited films by X-ray diffraction, scanning electronic microscope, X-ray photoelectron spectroscopy and ultraviolet-visible-near infrared spectroscopy consistently indicate that low oxygen flow rate (5 sccm) only creates metal-rich tungsten oxide films, while higher oxygen flow rate (10-20 sccm) assures the deposition of amorphous WO3 films. To explore the electrochromic function of deposited WO3 films, we use electrochemical tests to perform the insertion of lithium ions and electrons into films. The WO3 films switch between color and bleach states effectively by both potentiostat and cyclic voltammetry. Quantitative evaluation on electrochemical tests indicates that WO3 film with composition close to its stoichiometry is an optimal choice for electrochromic function.

AB - Tungsten oxide films under different oxygen flow rates are deposited by DC sputtering. The voltage change at target and analyses for the deposited films by X-ray diffraction, scanning electronic microscope, X-ray photoelectron spectroscopy and ultraviolet-visible-near infrared spectroscopy consistently indicate that low oxygen flow rate (5 sccm) only creates metal-rich tungsten oxide films, while higher oxygen flow rate (10-20 sccm) assures the deposition of amorphous WO3 films. To explore the electrochromic function of deposited WO3 films, we use electrochemical tests to perform the insertion of lithium ions and electrons into films. The WO3 films switch between color and bleach states effectively by both potentiostat and cyclic voltammetry. Quantitative evaluation on electrochemical tests indicates that WO3 film with composition close to its stoichiometry is an optimal choice for electrochromic function.

KW - Amorphous film

KW - Cyclic voltammetry

KW - Electrochemical insertion

KW - Electrochromism

KW - Potentiostat

KW - Sputtering

KW - Tungsten oxide

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JO - Thin Solid Films

JF - Thin Solid Films

ER -

Electrochromic study on amorphous tungsten oxide films by sputtering

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