跳至主導覽
跳至搜尋
跳過主要內容
國立陽明交通大學研發優勢分析平台 首頁
English
中文
在 國立陽明交通大學研發優勢分析平台 搜尋內容
首頁
人員
單位
研究成果
計畫
獎項
活動
貴重儀器
影響
Electrical and structural study on indium zinc oxide thin films by sputtering process
Chuan Li
*
, J. H. Hsieh
, S. J. Liu
, W. S. Lin
*
此作品的通信作者
生物醫學工程學系
研究成果
:
Article
›
同行評審
3
引文 斯高帕斯(Scopus)
總覽
指紋
指紋
深入研究「Electrical and structural study on indium zinc oxide thin films by sputtering process」主題。共同形成了獨特的指紋。
排序方式
重量
按字母排序
Keyphrases
Zinc Oxide Thin Films
100%
Sputtering Process
100%
Indium Zinc Oxide
100%
Indium
40%
Zinc Oxide
40%
Glass Substrate
20%
Electrical Conductivity
20%
Magnetron Sputtering
20%
Optical Emission Spectrometer
20%
Display Applications
20%
Film Properties
20%
High Content
20%
Four-point Probe
20%
Water Vapor
20%
Indium Oxide
20%
High Optical Transmittance
20%
Good Electrical Conductivity
20%
Plasma Ions
20%
Zinc-aluminum Alloy
20%
Ar Flow Rate
20%
Oxide Targets
20%
Plasma Condition
20%
Solar Energy Applications
20%
Massive Production
20%
Potential Density
20%
Ion Density
20%
Langmuir Probe
20%
Plasma Potential
20%
Plasma Diagnostics
20%
Rate Property
20%
Resistance to Water
20%
Plasma Electron Density
20%
Engineering
Thin Films
100%
Flow Rate
50%
Magnetron
50%
Solar Energy
50%
Process Parameter
50%
Probe Point
50%
Film Property
50%
Ion Density
50%
Plasma Diagnostics
50%
Phase Composition
50%
Electrical Conductivity
50%
Flow Velocity
50%
Glass Substrate
50%
Carrier Concentration
50%
Light Emission
50%
Material Science
Thin Films
100%
Zinc Oxide
100%
Indium
100%
Film
25%
Density
12%
Electrical Resistivity
12%
X-Ray Diffraction
12%
Magnetron Sputtering
12%
Aluminum
12%
Electrical Conductivity
12%
Water Vapor
12%
Phase Composition
12%
Chemical Engineering
Indium
100%
Film
100%
Zinc Oxide
100%
Magnetron Sputtering
12%
Plasma Diagnostics
12%