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Electrical and structural study on indium zinc oxide thin films by sputtering process
Chuan Li
*
, J. H. Hsieh, S. J. Liu, W. S. Lin
*
此作品的通信作者
生物醫學工程學系
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引文 斯高帕斯(Scopus)
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Engineering & Materials Science
Zinc oxide
100%
Indium
97%
Sputtering
96%
Oxide films
93%
Thin films
71%
Plasmas
19%
Langmuir probes
19%
Plasma diagnostics
19%
Carrier concentration
15%
Magnetron sputtering
14%
Opacity
13%
Spectrometers
12%
Electric Conductivity
12%
Water vapor
12%
Ions
9%
Solar energy
9%
Glass
8%
Aluminum
8%
Display devices
8%
Flow rate
8%
Substrates
7%
Chemical analysis
7%
Chemical Compounds
Sputtering
81%
Zinc Oxide
73%
Oxide
40%
Plasma
23%
Probe
23%
Magnetron Sputtering
21%
Solar Energy
20%
Transmittance
18%
Glass Substrate
18%
Liquid Film
18%
Water Vapor
17%
Electron Density
17%
Electrical Conductivity
14%
Flow Kinetics
14%
Resistance
11%
Ion
7%
Application
5%
Physics & Astronomy
indium oxides
74%
zinc oxides
72%
sputtering
58%
thin films
38%
indium
20%
electrical resistivity
13%
plasma potentials
13%
plasma diagnostics
13%
solar energy
12%
electrostatic probes
12%
water vapor
10%
light emission
10%
magnetron sputtering
9%
transmittance
8%
aluminum oxides
8%
flow velocity
8%
spectrometers
8%
probes
6%
glass
6%