Effects of postdeposition annealing on the characteristics of Hf Ox Ny dielectrics on germanium and silicon substrates

Chao Ching Cheng*, Chao-Hsin Chien, Ching Wei Chen, Shih Lu Hsu, Chun Hui Yang, Chun Yen Chang

*此作品的通信作者

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    16 引文 斯高帕斯（Scopus）

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    Keyphrases

    Material Science

    Engineering

    Chemical Engineering