Effects of N 2 O-annealed sacrificial oxide on the short-channel effects of nMOSFETs

F. C. Jong*, T. Y. Huang, Tien-Sheng Chao, Horng-Chih Lin, M. F. Wang, C. Y. Chang

*此作品的通信作者

研究成果: Article同行評審

摘要

The authors report the effects of N2O-annealed sacrificial oxide on nMOSFETs. It is demonstrated that by adding an N20-annealing step to the sacrificial oxide which was stripped off before growing the final gate oxide, the reverse short-channel effects (RSCE) can still be effectively suppressed.

原文English
頁(從 - 到)404-406
頁數3
期刊Electronics Letters
34
發行號4
DOIs
出版狀態Published - 19 2月 1998

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