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Effects of In/Zn composition on the Performance of Ultra-thin Atomic Layer Deposited InxZnl-xO Channel Thin-Film Transistors

  • Yan Kui Liang
  • , June Yang Zheng
  • , Jing Wei Lin
  • , Yi Miao Hua
  • , Tsung Te Chou
  • , Chun Chieh Lu
  • , Huai Ying Huang
  • , Yu Ming Lin
  • , Chi Chung Kei
  • , Edward Yi Chang
  • , Chun Hsiung Lin

研究成果: Conference contribution同行評審

3 引文 斯高帕斯(Scopus)

摘要

This study focuses on the fabrication of high-performance thin-film transistors (TFTs) using an atomic layer deposited (ALD) ultra-thin (4 nm) amorphous InX Zn1-XO (IZO) channel. We investigated the impact of composition and annealing on the performance of TFTs with InxZn1-xO channel layers (x=0.3,0.5,0.8, and 1). Among the various compositions, the TFT with In0.5 Zn0.5O channel demonstrated optimal electrical characteristics for normally-off operation and integration with complementary metal-oxide-semiconductor (CMOS) technology. These characteristics include a high mobility of 52 cm2/V · s, a positive threshold voltage of 0.1 V, a low subthreshold gate swing of 83 mV/decade, and an ION/IOFF current ratio over 109.

原文English
主出版物標題7th IEEE Electron Devices Technology and Manufacturing Conference
主出版物子標題Strengthen the Global Semiconductor Research Collaboration After the Covid-19 Pandemic, EDTM 2023
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9798350332520
DOIs
出版狀態Published - 2023
事件7th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2023 - Seoul, 韓國
持續時間: 7 3月 202310 3月 2023

出版系列

名字7th IEEE Electron Devices Technology and Manufacturing Conference: Strengthen the Global Semiconductor Research Collaboration After the Covid-19 Pandemic, EDTM 2023

Conference

Conference7th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2023
國家/地區韓國
城市Seoul
期間7/03/2310/03/23

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