Effects of interfacial sulfidization and thermal annealing on the electrical properties of an atomic-layer-deposited Al2 O3 gate dielectric on GaAs substrate
Chao Ching Cheng*, Chao-Hsin Chien, Guang Li Luo, Chun Hui Yang, Ching Chih Chang, Chun Yen Chang, Chi Chung Kei, Chien Nan Hsiao, Tsong Pyng Perng
*此作品的通信作者
研究成果: Article › 同行評審
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斯高帕斯（Scopus）