Effects of hydrogen on electrical and chemical properties of low-k hydrogen silsesquioxane as an intermetal dielectric for nonetchback processes

T. C. Chang*, Po-Tsun Liu, F. Y. Shih, S. M. Sze

*此作品的通信作者

研究成果: Article同行評審

19 引文 斯高帕斯(Scopus)

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深入研究「Effects of hydrogen on electrical and chemical properties of low-k hydrogen silsesquioxane as an intermetal dielectric for nonetchback processes」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy