Effects of energetic particle bombardment on residual stress, microstrain and grain size of plasma-assisted PVD Cr thin films

J. H. Hsieh*, C. Li, W. Wu, R. F. Hochman

*此作品的通信作者

研究成果: Conference article同行評審

17 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Physics & Astronomy

Chemical Compounds