Effects of energetic particle bombardment on residual stress, microstrain and grain size of plasma-assisted PVD Cr thin films

J. H. Hsieh*, C. Li, W. Wu, R. F. Hochman

*此作品的通信作者

研究成果: Conference article同行評審

17 引文 斯高帕斯(Scopus)

摘要

Residual stress, microstrain and grain size of ion plated Cr films deposited on molybdenum substrates were analyzed and studied. A model based on the effects of incident particle energy and/or momentum on the properties of these films is proposed and discussed. It was concluded that the film properties may be affected by both the momentum and energy transfer of the incident particles, or by either one.

原文English
頁(從 - 到)103-106
頁數4
期刊Thin Solid Films
424
發行號1
DOIs
出版狀態Published - 22 1月 2003
事件proceedings of the 1st Ineternational Conference on Materials - Singapore, Singapore
持續時間: 1 7月 20016 7月 2001

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