Effects of Ar/N2 flow ratio on sputtered-AlN film and its application to low-voltage organic thin-film transistors

Hsiao-Wen Zan*, Kuo Hsi Yen, Pu Kuan Liu, Kuo Hsin Ku, Chien Hsun Chen, Jennchang Hwang

*此作品的通信作者

研究成果: Article同行評審

6 引文 斯高帕斯(Scopus)

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Keyphrases

Material Science

Chemical Engineering