Effectiveness of NH3 plasma treatment in preventing wet stripper damage to low-k hydrogen silsesquioxane (HSQ)

Ting Chang, Yi Shien Mor, Po-Tsun Liu, Tsung Ming Tsai, Chi Wen Chen, Yu Jen Mei, Simon M. Sze

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

指紋

深入研究「Effectiveness of NH3 plasma treatment in preventing wet stripper damage to low-k hydrogen silsesquioxane (HSQ)」主題。共同形成了獨特的指紋。

Keyphrases

Material Science