Effect of interfacial layer on device performance of metal oxide thin-film transistor with a multilayer high-k gate stack

Dun Bao Ruan, Po-Tsun Liu*, Yu Chuan Chiu, Po Yi Kuo, Min Chin Yu, Kai Zhi Kan, Ta Chun Chien, Yi Heng Chen, Simon M. Sze

*此作品的通信作者

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy